Product Series:

iStellar-500

Low-energy, high-current ion implanter employing a ‘universal platform + key technology modules’ R&D model. Adhering to original design principles and incorporating years of engineering expertise, it achieves high beam transport efficiency with an energy range of 0.2–60/80 keV.

iStellar-500C

Low-energy, high-current cryogenic ion implanter. Based on the iStellar-500 beam system, it delivers low failure rates and high reliability, enabling implantation at ultra-low temperatures down to -100°C.

iStellar-500CIS

High-current ion implanter for CIS applications, built upon the mass-verified iStellar universal implantation platform and optical system. The mature, stable equipment delivers exceptional metal contamination control and high-precision angle control.

iStellar-500HT

Low-energy, high-current, high-temperature ion implanter based on the iStellar-500 beam system, enabling RT (room temperature) and 250°C high-temperature implantation suitable for advanced processes;